WEKO3
アイテム
{"_buckets": {"deposit": "64b152b6-9f77-4fe4-8a12-3d6d96d40578"}, "_deposit": {"created_by": 3, "id": "10380", "owners": [3], "pid": {"revision_id": 0, "type": "depid", "value": "10380"}, "status": "published"}, "_oai": {"id": "oai:nifs-repository.repo.nii.ac.jp:00010380", "sets": ["32"]}, "author_link": ["65285", "65287", "65283", "65284", "65286", "65288"], "item_5_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2004-04-01", "bibliographicIssueDateType": "Issued"}, "bibliographic_titles": [{}, {"bibliographic_title": "Research Report NIFS-Series", "bibliographic_titleLang": "en"}]}]}, "item_5_description_5": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "\"Because of using the carbon-based wall protection in fusion devices, many surfaces of inner components, remote from plasma, become to be coated with carbon film. Between components subjected to C film deposition are elements of plasma diagnostics, e.g., in-vessel mirrors and windows of laser and optical methods. From time to time these elements have to be cleaned from the contaminating films. One possible method is to use a cleaning discharge with low temperature plasma (Te leq 5 eV) however, at that the efficiency of removal of hydrocarbon film molecules is quite small, ~2-3 %. The rate of C film cleaning could be significantly increased by providing discharge in oxygen (with efficiency up to 30%), but the use of this gas is impossible in fusion devices. The alternative method to enhance the efficiency of C film cleaning is to use the plasma produced by discharge in mixture of hydrogen with one of heavy rare gases, as was suggested in [4]. This approach is not in contradiction with the general conception of the fusion reactor project, where the addition of a rare gas (heavier than helium) is considered as a real method to control the periphery plasma parameters. In the present paper we analyze the published data on all important reactions in a low-temperature plasma produced in mixture of hydrogen with rare gases: Ne, Ar, Xe, Kr. The main peculiarity of such plasma is the appearance of a group of hydride ions, namely NeH^+, ArH^+, XeH^+, KrH^+, which probably is the main factor leading to increase of the rate of removing C film from contaminated surfaces compare to pure hydrogen plasma but practically do not exist as neutrals. The comparison data on cross sections of different reactions demonstrates clearly that between all rare gases, the highest concentrations of hydride ions would be in the Ar-H_2 mixture plasma.\"", "subitem_description_type": "Abstract"}]}, "item_5_source_id_10": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0915-633X", "subitem_source_identifier_type": "ISSN"}]}, "item_5_text_25": {"attribute_name": "登録情報", "attribute_value_mlt": [{"subitem_text_value": "Made available in DSpace on 2010-02-05T10:20:19Z (GMT). No. of bitstreams: 0\n Previous issue date: 2004-04"}]}, "item_5_text_8": {"attribute_name": "報告書番号", "attribute_value_mlt": [{"subitem_text_value": "NIFS-799"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "metadata only access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_14cb"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "\"Voitsenya, V.S.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65283", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Naidenkova, D.I.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65284", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kubota, Y.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65285", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Masuzaki, S.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65286", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sagara, A.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65287", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Yamazaki, K.\"", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "65288", "nameIdentifierScheme": "WEKO"}]}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "Cleaning of in-vessel components", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "glow discharge", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "hydrocarbon film removal", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "mixture of hydrogen with rare gases", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "hydride ions", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "research report", "resourceuri": "http://purl.org/coar/resource_type/c_18ws"}]}, "item_title": "On the Possibility to Increase Efficiency of Conditioning of Vacuum Surfaces by Using a Discharge in a Hydrogen-noble Gas Mixture", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "On the Possibility to Increase Efficiency of Conditioning of Vacuum Surfaces by Using a Discharge in a Hydrogen-noble Gas Mixture", "subitem_title_language": "en"}]}, "item_type_id": "5", "owner": "3", "path": ["32"], "permalink_uri": "http://hdl.handle.net/10655/3191", "pubdate": {"attribute_name": "公開日", "attribute_value": "2010-02-05"}, "publish_date": "2010-02-05", "publish_status": "0", "recid": "10380", "relation": {}, "relation_version_is_last": true, "title": ["On the Possibility to Increase Efficiency of Conditioning of Vacuum Surfaces by Using a Discharge in a Hydrogen-noble Gas Mixture"], "weko_shared_id": -1}
On the Possibility to Increase Efficiency of Conditioning of Vacuum Surfaces by Using a Discharge in a Hydrogen-noble Gas Mixture
http://hdl.handle.net/10655/3191
http://hdl.handle.net/10655/319195fa09e5-559a-4ae0-b153-98a11e3427d3
Item type | 研究報告書 / Research Paper(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2010-02-05 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | On the Possibility to Increase Efficiency of Conditioning of Vacuum Surfaces by Using a Discharge in a Hydrogen-noble Gas Mixture | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Cleaning of in-vessel components | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | glow discharge | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | hydrocarbon film removal | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | mixture of hydrogen with rare gases | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | hydride ions | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_18ws | |||||
資源タイプ | research report | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
"Voitsenya, V.S.
× "Voitsenya, V.S.× Naidenkova, D.I.× Kubota, Y.× Masuzaki, S.× Sagara, A.× Yamazaki, K." |
|||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | "Because of using the carbon-based wall protection in fusion devices, many surfaces of inner components, remote from plasma, become to be coated with carbon film. Between components subjected to C film deposition are elements of plasma diagnostics, e.g., in-vessel mirrors and windows of laser and optical methods. From time to time these elements have to be cleaned from the contaminating films. One possible method is to use a cleaning discharge with low temperature plasma (Te leq 5 eV) however, at that the efficiency of removal of hydrocarbon film molecules is quite small, ~2-3 %. The rate of C film cleaning could be significantly increased by providing discharge in oxygen (with efficiency up to 30%), but the use of this gas is impossible in fusion devices. The alternative method to enhance the efficiency of C film cleaning is to use the plasma produced by discharge in mixture of hydrogen with one of heavy rare gases, as was suggested in [4]. This approach is not in contradiction with the general conception of the fusion reactor project, where the addition of a rare gas (heavier than helium) is considered as a real method to control the periphery plasma parameters. In the present paper we analyze the published data on all important reactions in a low-temperature plasma produced in mixture of hydrogen with rare gases: Ne, Ar, Xe, Kr. The main peculiarity of such plasma is the appearance of a group of hydride ions, namely NeH^+, ArH^+, XeH^+, KrH^+, which probably is the main factor leading to increase of the rate of removing C film from contaminated surfaces compare to pure hydrogen plasma but practically do not exist as neutrals. The comparison data on cross sections of different reactions demonstrates clearly that between all rare gases, the highest concentrations of hydride ions would be in the Ar-H_2 mixture plasma." | |||||
書誌情報 |
en : Research Report NIFS-Series 発行日 2004-04-01 |
|||||
報告書番号 | ||||||
NIFS-799 | ||||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0915-633X |