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Dependence of Au- Production upon the Target Work Function in a Plasma-Sputter-Type Negative Ion Source
http://hdl.handle.net/10655/2834
http://hdl.handle.net/10655/2834c3f11cd9-4cb3-4af8-a606-13e5d8f643dc
Item type | 研究報告書 / Research Paper(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2010-02-05 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Dependence of Au- Production upon the Target Work Function in a Plasma-Sputter-Type Negative Ion Source | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Au^- | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | work function | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | plasma | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | negative ion source | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | photoelectric effect | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | ion source | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_18ws | |||||
資源タイプ | research report | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
"Okabe, Y.
× "Okabe, Y.× Sasao, M.× Yamaoka, H.× Wada, M.× Fujita, J." |
|||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | "A method to measure the work function of the target surface in a plasma-sputter-type negative ion source has been developed. The present method can be used to determine the work function by measuring the photoelectric current induced by two lasers (He-Ne, Ar^+ Iaser). The dependence of Au^- production upon the work function of the target surface in the ion source was studied using this method. The time variation of the target work function and Au^- production rate were measured during the cesium coverage decrease due to the plasma ion sputtering. The observed minimum work function of a cesiated gold surface in an Ar plasma was 1.3eV where the negative ion production rate (Au^- current/target current) took the maximum value. The negative ion production rate showed the same dependence on the incident ion energy as that of the sputtering rate when the work function was constant." | |||||
書誌情報 |
en : Research Report NIFS-Series 発行日 1991-05-01 |
|||||
報告書番号 | ||||||
NIFS-085 | ||||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0915-633X |