@techreport{oai:nifs-repository.repo.nii.ac.jp:00010070,
 author = {"Noda,  N. and Tsuzuki,  K. and Sagara,  A. and Inoue,  N. and Muroga,  T."},
 month = {Jul},
 note = {"A thin boron film is attractive as a deuterium/tritium free wall, and as a protecting layer against impact of energetic charge-exchange neutrals in future fusion devices with a long-time operation. New experimental evidences are given for desorption of hydrogen isotopes at relatively low temperature. All hydrogen atoms in a boron-coated layer are reemitted to the plasma side below 400degreeC without their penetration into substrate of stainless steel. A problem is maintainability of a thin boron layer during a long-time operation. Boron atoms are hardly removed by pumping because its hydrides are easily disintegrated and redeposited Gross immigration of boron atoms inside the vessel is a concern. A condition required for avoiding the immigration is discussed."},
 title = {Boronization in Future Devices -Protecting Layer against Tritium and Energetic Neutrals-},
 year = {1998}
}