{"created":"2023-06-20T15:16:24.567399+00:00","id":10110,"links":{},"metadata":{"_buckets":{"deposit":"c9badd83-d2dd-40bd-b64d-7e7f14e25b9f"},"_deposit":{"created_by":3,"id":"10110","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"10110"},"status":"published"},"_oai":{"id":"oai:nifs-repository.repo.nii.ac.jp:00010110","sets":["8:32"]},"author_link":["63087","63085","63088","63091","63082","63089","63090","63084","63083","63086"],"item_5_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1999-12-01","bibliographicIssueDateType":"Issued"},"bibliographic_titles":[{},{"bibliographic_title":"Research Report NIFS-Series","bibliographic_titleLang":"en"}]}]},"item_5_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"\"A compact cesium deposition system was used for direct deposition of cesim atoms and ion onto the inner surface of the 1/3 scale Hydrogen Negative Ion Source for the LHD-NBI system.  A small, well defined amount of cesium deposition in the range of 3-200 mg was tested.  Negative ion extraction and acceleration were carried out both in the pure hydrogen operation mode and in the cesium mode.  Single Cs deposition of 3-30 mg to the plasma chamber have produced temporary 2-5 times increases of H- yield, but the yield was decreased within several discharge pulses to the previous steady-state value.  Two consecutive 30 mg depositions done within a 3-5 hours/ 60 shot interval, produced a similar temporary increase of H- beam,  but reached a larger H-yielad steady-state value.  Deposition of arger 0.1-0.2 g Cs portions with a 20-120 hours/150-270 shot interval improved the H-yield for a long (2-5 days) period of operation.  Directed depositions of Cs to the various walls of the plasma chamber showed approximately the same H- increase.  Deposition of 0.13 g Cs to a surface polluted by a water leak, produced a temporary  increase, and an H- steady-state level similar to that from a single 30 mg cesium deposition.  Deposition of 0.1 g with a cesium plasma produced one half the H-yield obtained by deposition of the same amount of cesium atoms.  A higher steady-state H- current value and a smaller rate of H- yield decrease was recorded during the 8 filaments discharge operation, as compared to the 12 filaments operation at the same discharge power.\"","subitem_description_type":"Abstract"}]},"item_5_source_id_10":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0915-633X","subitem_source_identifier_type":"ISSN"}]},"item_5_text_8":{"attribute_name":"報告書番号","attribute_value_mlt":[{"subitem_text_value":"NIFS-620"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"\"Oka,  Y.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Takeiri,  Y.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yu.I., Belchenko","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Hamabe,  M.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kaneko,  O.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Tsumori,  K.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Osakabe,  M.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Asano,  E.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kawamoto,  T.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Akiyama,  R.\"","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"hydrogen negative ion","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"ion surce","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"cesium deposition","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"NBI","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"research report","resourceuri":"http://purl.org/coar/resource_type/c_18ws"}]},"item_title":"Optimization of Cs Deposition in the 1/3 Scale Hydrogen Negative Ion Source for LHD-NBI System","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Optimization of Cs Deposition in the 1/3 Scale Hydrogen Negative Ion Source for LHD-NBI System","subitem_title_language":"en"}]},"item_type_id":"5","owner":"3","path":["32"],"pubdate":{"attribute_name":"公開日","attribute_value":"2010-02-05"},"publish_date":"2010-02-05","publish_status":"0","recid":"10110","relation_version_is_last":true,"title":["Optimization of Cs Deposition in the 1/3 Scale Hydrogen Negative Ion Source for LHD-NBI System"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-06-20T20:53:31.120586+00:00"}