@techreport{oai:nifs-repository.repo.nii.ac.jp:00010338,
 author = {"Tsuzuki,  K. and Natsir,  M. and Inoue,  N. and Sagara,  A. and Noda,  N. and Motojima,  O. and Mochizuki,  T. and Fujita,  I. and Hino,  T. and Yamashina,  T."},
 month = {Sep},
 note = {"Hydrogen absorption and desorption characteristics in boron films deposited on a graphite liner have been studied. Number of hydrogen atoms absorbed in the films is estimated from a decrease in hydrogen pressure during a hydrogen glow discharge. It was 1.9 x l0^17 atoms/cm^2 in the I hour discharge after an evacuation of H atoms contained in the original boron films by thermal desorption. Hydrogen atoms were absorbed continuously without saturation for 3 hours during the discharge. Number of H atoms absorbed reached to 2.6 x 10^ 17 atoms/cm^2 at 3 hour. A discharge in helium was carried out to investigate H desorption characteristics from hydrogen implanted boron films. It was verified that reactivity for hydrogen absorption was recovered after the He discharge. Hydrogen atoms were accumulated in the films by repetition of alternate He and H_2 discharge. Thermal desorption experiments have been carried out by raising the liner temperature up to 500 degree C for films after I hour, 3 hours hydrogen discharge and 6 times repetition of H_2/He discharges. Most of H atoms in the films were desorbed for all these cases. The slow absorption process was confirmed through the thermal desorption experiments."},
 title = {Behavior of Hydrogen Atoms in Boron Films during H2 and He Glow Discharge and Thermal Desorption},
 year = {1995}
}