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Behavior of Hydrogen Atoms in Boron Films during H2 and He Glow Discharge and Thermal Desorption
http://hdl.handle.net/10655/3062
http://hdl.handle.net/10655/30629e9fac90-2938-4922-8f19-0bb19a6ce303
Item type | 研究報告書 / Research Paper(1) | |||||
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公開日 | 2010-02-05 | |||||
タイトル | ||||||
タイトル | Behavior of Hydrogen Atoms in Boron Films during H2 and He Glow Discharge and Thermal Desorption | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | boron coating films | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | hydrogen recycling | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | hydrogen retention | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | hydrogen glow discharge | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | helium glow discharge | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | thermal desorption | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_18ws | |||||
資源タイプ | research report | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
"Tsuzuki, K.
× "Tsuzuki, K.× Natsir, M.× Inoue, N.× Sagara, A.× Noda, N.× Motojima, O.× Mochizuki, T.× Fujita, I.× Hino, T.× Yamashina, T." |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | "Hydrogen absorption and desorption characteristics in boron films deposited on a graphite liner have been studied. Number of hydrogen atoms absorbed in the films is estimated from a decrease in hydrogen pressure during a hydrogen glow discharge. It was 1.9 x l0^17 atoms/cm^2 in the I hour discharge after an evacuation of H atoms contained in the original boron films by thermal desorption. Hydrogen atoms were absorbed continuously without saturation for 3 hours during the discharge. Number of H atoms absorbed reached to 2.6 x 10^ 17 atoms/cm^2 at 3 hour. A discharge in helium was carried out to investigate H desorption characteristics from hydrogen implanted boron films. It was verified that reactivity for hydrogen absorption was recovered after the He discharge. Hydrogen atoms were accumulated in the films by repetition of alternate He and H_2 discharge. Thermal desorption experiments have been carried out by raising the liner temperature up to 500 degree C for films after I hour, 3 hours hydrogen discharge and 6 times repetition of H_2/He discharges. Most of H atoms in the films were desorbed for all these cases. The slow absorption process was confirmed through the thermal desorption experiments." | |||||
書誌情報 |
en : Research Report NIFS-Series 発行日 1995-09-01 |
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報告書番号 | ||||||
値 | NIFS-374 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0915-633X |